华为或计划于26年量产基于LDP技术的EUV光刻机
华为似乎正在开发自己的 EUV 技术，使用激光诱导放电等离子体（LDP）技术，计划在 2026 年实现量产。
据 Techzine 报道，这一技术可能比 ASML 的激光产生等离子体（LPP）技术更节能，同时能产生同样所需的 13.5 纳米 EUV 辐射，用于先进芯片制造。这可能威胁 ASML 的市场主导地位，尤其是在中国芯片制造商如中芯国际因出口限制而受限于 DUV 技术时。
techzine
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